This technical complementary Chemical Engineering course aims at developing a general understanding of the plasma state and of its use as a processing medium, at developing skills for plasma process and reactor design, instrumentation and measurements, and at gaining a broad knowledge of various plasma processes and plasma-based devices. This course is offered to both undergraduate and graduate students.
Instructors: Profs. Sylvain Coulombe, Pierre-Luc Girard-Lauriault, Jean-Luc Meunier
Next time offered: Fall 2014