Facilities

tCVD_2
Thermal chemical vapour deposition (t-CVD)

PLA_3

Pulsed laser ablation (PLA) and plasma-enhanced CVD system

073-141208-154633-0405
PECVD system inside a glove box

IMG_0210
Capacitively-coupled PECVD system

IMG_0213
Nanosecond pulser and plasma-assisted combustion (PAC) system

IMG_0211
Plasma-catalytic reformer I

IMG_0212
Plasma-catalytic reformer II

IMG_0214
Twin-electrode DC electric arc furnace (EAF)